| Chemical etching treatment promotes effi... |
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08-09 21:42 |
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| Thickness-controlled stoichiometry gover... |
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08-09 21:41 |
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| Electronic Structure and Optical Charact... |
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08-09 21:39 |
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| Characteristics of nickel silicide thin ... |
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08-09 21:38 |
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| The formation of regular alpha Ni-gamma(... |
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08-09 21:35 |
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| CALPHAD-aided designing complex brass al... |
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08-09 21:33 |
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| Construction of anti-oxidative and effic... |
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08-09 21:32 |
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| Lateral growth of NiSi at the θ-Ni_2Si/S... |
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08-09 21:30 |
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| Nucleation and lateral growth kinetics o... |
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08-09 21:29 |
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| Microstructures and properties of Ni-Si ... |
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08-09 21:27 |
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